2026-03-14T17:29:01Z https://kumadai.repo.nii.ac.jp/oai

oai:kumadai.repo.nii.ac.jp:00032085 2023-09-07T05:53:55Z 426:428

Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent 谷田部, 然治 ヤタベ, ゼンジ Yatabe, Zenji Nishiyama, Koshi Tsuda, Takaaki 中村 , 有水 ナカムラ , ユウスイ Nakamura, Yusui (C) 2019 The Ceramic Society of Japan 501 Mist chemical vapor deposition Aluminium oxide Bandgap Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method. The Ceramic Society of Japan 2019-08-01 eng journal article VoR http://hdl.handle.net/2298/00043684 https://kumadai.repo.nii.ac.jp/records/32085 https://doi.org/10.2109/jcersj2.19017 130007687006 18820743 Journal of the Ceramic Society of Japan 127 8 590 593 https://kumadai.repo.nii.ac.jp/record/32085/files/127_19017.pdf application/pdf 617.7 kB 2021-02-18