2026-03-14T00:16:58Z https://kumadai.repo.nii.ac.jp/oai

oai:kumadai.repo.nii.ac.jp:00032085 2023-09-07T05:53:55Z 426:428

Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent 谷田部, 然治 165546 ヤタベ, ゼンジ Yatabe, Zenji Nishiyama, Koshi 165551 Tsuda, Takaaki 165552 中村 , 有水 165821 ナカムラ , ユウスイ Nakamura, Yusui 501 Mist chemical vapor deposition Aluminium oxide Bandgap Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method. journal article The Ceramic Society of Japan 2019-08-01 VoR application/pdf Journal of the Ceramic Society of Japan 8 127 590 593 18820743 https://kumadai.repo.nii.ac.jp/record/32085/files/127_19017.pdf http://hdl.handle.net/2298/00043684 https://kumadai.repo.nii.ac.jp/records/32085 eng 130007687006 (C) 2019 The Ceramic Society of Japan