| Item type |
会議発表論文 / Conference Paper(1) |
| 公開日 |
2010-09-16 |
| タイトル |
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|
タイトル |
Extreme ultraviolet radiation from Z-pinch plasmas for next generation lithography |
|
言語 |
en |
| 言語 |
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|
言語 |
eng |
| 資源タイプ |
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資源タイプ識別子 |
http://purl.org/coar/resource_type/c_5794 |
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資源タイプ |
conference paper |
| 著者 |
秋山, 秀典
勝木, 淳
浪平, 隆男
佐久川, 貴志
今村, 英樹
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| 内容記述 |
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内容記述 |
Development of the high power EUV (extreme ultraviolet) source has been expected as a light source for the next generation lithography. There are two kinds of EUV sources: the discharge produced plasma (DPP) and the laser produced plasma (LPP). The DPP method is considered to be promising in easiness of radiating the high power EUV and in the cheapness of constructing the EUV source. The Z- pinch plasmas driven by pulsed power have been used mainly in the DPP method. Here, the research results of the DPP method at Kumamoto University are summarized. |
| 書誌情報 |
en : Conference Record of the International Power Modulator Symposium and High Voltage Workshop
p. 356-359,
発行日 2006-05-14
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| ISSN |
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収録物識別子 |
1930-885X |
| DOI |
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関連タイプ |
isIdenticalTo |
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関連識別子 |
https://doi.org/10.1109/MODSYM.2006.365258 |
| 権利 |
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言語 |
en |
|
権利情報 |
(C)2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. |
| 著者版フラグ |
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出版タイプ |
VoR |
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出版タイプResource |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
| 日本十進分類法 |
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|
主題Scheme |
NDC |
|
主題 |
540 |
| 出版者 |
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出版者 |
Institute of Electrical and Electronics Engineers |
|
言語 |
en |
| コメント |
|
|
言語 |
en |
|
値 |
Power Modulator Symposium, 2006. Conference Record of the 2006 Twenty-Seventh International, 14-18 May 2006 |
IEEE_CRIPMSHVW2006r.pdf (407.1 kB)
