@article{oai:kumadai.repo.nii.ac.jp:00032085,
 author = {谷田部, 然治 and Yatabe, Zenji and Nishiyama, Koshi and Tsuda, Takaaki and 中村 , 有水 and Nakamura, Yusui},
 issue = {8},
 journal = {Journal of the Ceramic Society of Japan},
 month = {Aug},
 note = {Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method.},
 pages = {590--593},
 title = {Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent},
 volume = {127},
 year = {2019},
 yomi = {ヤタベ, ゼンジ and ナカムラ , ユウスイ}
}