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Novel Dual Marx Generator for Microplasma Applications
http://hdl.handle.net/2298/3495
http://hdl.handle.net/2298/349514e7c0ea-1d0a-476e-ae0d-6c96c98d74ce
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
01495559.pdf (818.1 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
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| 公開日 | 2007-08-09 | |||||
| タイトル | ||||||
| タイトル | Novel Dual Marx Generator for Microplasma Applications | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題 | Avalanche breakdown, Marx generators, plasma generation, pulse generation | |||||
| 資源タイプ | ||||||
| 資源タイプ | journal article | |||||
| 著者 |
Heeren, Tammo
× Heeren, Tammo× 上野, 崇寿× 王, 斗艶× 浪平, 隆男× 勝木, 淳× Akiyama, Hidenori |
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| 内容記述 | ||||||
| 内容記述 | Micrometer size plasmas, or microplasmas, find applications in pollution control, reduction, and prevention. The required nonthermal plasmas can be generated by either an electron beam or an electric discharge. The pulse widths and voltages necessary to generate these nonthermal plasmas are 10- 10-10-8 s, and 103-104 V, respectively, depending on the application. The required energy is typically in the low 10-3 J range. This paper presents a novel circuit design to generate high-voltage pulses with variable pulse widths and pulse rise and fall times in the low 10-9 s regime. The circuit employs two parallel Marx Generators utilizing bipolar junction transistors (BJTs) as closing switches. The BJTs are operated in the avalanche mode to yield fast rise times. The design allows for positive or negative polarity pulses, and can easily be changed to yield higher or lower output voltage. | |||||
| 書誌情報 |
IEEE TRANSACTIONS ON PLASMA SCIENCE 巻 33, 号 4, p. 1205-1209, 発行年 2005-08 |
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| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA0066803X | |||||
| DOI | ||||||
| 関連タイプ | isIdenticalTo | |||||
| 関連識別子 | https://doi.org/10.1109/TPS.2005.852433 | |||||
| 権利 | ||||||
| 権利情報 | (C)2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. IEEE, IEEE TRANSACTIONS ON PLASMA SCIENCE, 33, 4, 2005, 1205-1209 | |||||
| フォーマット | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | application/pdf | |||||
| 形態 | ||||||
| 818125 bytes | ||||||
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| 出版タイプ | VoR | |||||
| 日本十進分類法 | ||||||
| 主題Scheme | NDC | |||||
| 主題 | 500 | |||||
| 出版者 | ||||||
| 出版者 | Institute of Electrical and Electronics Engineers | |||||
| 資源タイプ | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | 論文(Article) | |||||
| 資源タイプ・ローカル | ||||||
| 雑誌掲載論文 | ||||||
| 資源タイプ・NII | ||||||
| Journal Article | ||||||
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| text | ||||||
| 資源タイプ・ローカル表示コード | ||||||
| 01 | ||||||
