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  1. 理学
  2. 発表論文(理学系)

Evaporation-rate and substrate-temperature dependence of direct exciton transitions in BiI3 thin films formed by hot-wall technique on Al2O3 substrates

http://hdl.handle.net/2298/43202
http://hdl.handle.net/2298/43202
948c8362-360c-4237-8fd9-ab685119543f
名前 / ファイル ライセンス アクション
physica physica status solidi B.255,(11),1800092-1-1800092-9.pdf (524.9 kB)
Item type プレプリント / Preprint(1)
公開日 2020-02-14
タイトル
タイトル Evaporation-rate and substrate-temperature dependence of direct exciton transitions in BiI3 thin films formed by hot-wall technique on Al2O3 substrates
言語 en
言語
言語 eng
キーワード
主題 BiI3, exciton, hot-wall technique, inner exciton, interface exciton
資源タイプ
資源タイプ other
著者 有嶋, 駿士郎

× 有嶋, 駿士郎

WEKO 141727

en Arishima, Syunshiro

ja 有嶋, 駿士郎

ja-Kana アリシマ, シュンシロウ

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村田, 康樹

× 村田, 康樹

WEKO 141728

en Murata, Koki

ja 村田, 康樹

ja-Kana ムラタ, コウキ

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坂本, 隆太

× 坂本, 隆太

WEKO 141743

en Sakamoto, Ryuta

ja 坂本, 隆太

ja-Kana サカモト, リュウタ

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上田, 智博

× 上田, 智博

WEKO 141744

en Ueda, Tomohiro

ja 上田, 智博

ja-Kana ウエダ, トモヒロ

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市川, 聡夫

× 市川, 聡夫

WEKO 165988

en Ichikawa, Fusao

ja 市川, 聡夫

ja-Kana イチカワ, フサオ

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岩満, 一功

× 岩満, 一功

WEKO 141732

en Iwamitsu, Kazunori

ja 岩満, 一功

ja-Kana イワミツ, カズノリ

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赤井, 一郎

× 赤井, 一郎

WEKO 147109

en Akai, Ichiro

ja 赤井, 一郎

ja-Kana アカイ, イチロウ

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内容記述
内容記述 Using a hot-wall technique, BiI3 thin films were deposited on alpha-Al2O3 substrates at different evaporation rates and substrate temperatures in order to optimize these conditions. From X-ray diffraction data, it was confirmed that BiI3 layers were regularly stacked. Absorption due to direct excitons in BiI3 was observed in the deposited thin films. To study the translational symmetry and homogeneity of the films, changes in direct exciton transitions were examined. Direct excitons could be split into inner X^Inner and interface X^Inner excitons due to a collapse of translational symmetry along the stacking direction for a finite thickness, and the mean value hat-E and the energy difference Delta-E for the transition energies for these excitons were obtained. To evaluate the sample quality, the dependence of hat-E and Delta-E on the deposition conditions was investigated based on a tight-binding model for flake-like crystals consisting of a finite number n of BiI3 layers. In this model, a site shift energy delta was introduced for the interfaced BiI3 layers, which represents the difference of the on-site energy for the excitons. From the magnitude of Delta-E, the BiI3 thin films are considered to consist of packed flake-like crystals, whose translational symmetry will be maintained within four or five (n=4 or
5) BiI3 layers. From the variations of delta, it was found that an evaporation rate of about 0.8 AA/s and a substrate temperature of 75C are the best conditions for BiI3 thin film deposition on alpha-Al2O3 substrates.
書誌情報 en : Physica Status Solidi B

巻 255, 号 11, p. 1800092-1-1800092-9, 発行日 2018-08-16
ISSN
収録物識別子 0370-1972
DOI
関連タイプ isVersionOf
関連識別子 https://doi.org/10.1002/pssb.201800092
権利
権利情報 (C) 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
著者版フラグ
出版タイプ AO
出版タイプResource http://purl.org/coar/version/c_b1a7d7d4d402bcce
日本十進分類法
主題Scheme NDC
主題 421.3
出版者
出版者 Wiley
言語 en
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