The purpose of this study is to make clear the effect of the spin-up acceleration on the boundary layer over the rotating wafer surface. In this paper, onset and breakdown of transient vortices are investigated because transient vortices interfere with the formation of uniform thin film. The air flow fields on the wafer surface are measured by a hot wire anemometer. The onset of transient vortices over the rotating wafer is detected by the spectra of the tangential fluctuating velocity. It is found that transient vortices appear at higher Reynolds number in the case of higher spin-up acceleration of the wafer. On the other hand, transient vortices break down at a certain Reynolds number and the transition of the boundary layer to the turbulent state is independent of the spin up acceleration.
雑誌名
日本機械学會論文集. B編
巻
74
号
744
ページ
1735 - 1740
発行年
2008-08-25
書誌レコードID
AN00187441
権利
社団法人 日本機械学会
情報源(ISSN)
03875016
フォーマット
application/pdf
形態
644863 bytes
著者版フラグ
publisher
日本十進分類法
530
その他の言語のタイトル
Effect of Spin-up Acceleration on Onset of Transient Vortices over Rotating Wafer(Fluids Engineering)
回転加速度がウェーハ上の遷移渦の初生に与える影響(流体工学,流体機械)
110006873936.pdf
(644.86KB)
