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Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent
http://hdl.handle.net/2298/00043684
http://hdl.handle.net/2298/00043684fac61d80-96c4-46e1-8a89-e00e6917d6e5
名前 / ファイル | ライセンス | アクション |
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127_19017 (617.7 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2021-02-18 | |||||
タイトル | ||||||
言語 | en | |||||
タイトル | Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent | |||||
言語 | ||||||
言語 | eng | |||||
キーワード | ||||||
主題 | Mist chemical vapor deposition, Aluminium oxide, Bandgap | |||||
資源タイプ | ||||||
資源タイプ | journal article | |||||
著者 |
谷田部, 然治
× 谷田部, 然治× Nishiyama, Koshi× Tsuda, Takaaki× 中村 , 有水 |
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内容記述 | ||||||
内容記述 | Excellent quality amorphous aluminum oxide (AlOx) thin films have been obtained by atmospheric pressure solution-processed mist chemical vapor deposition (mist-CVD) technique at 400°C using water-free solvent. X-ray fluorescence investigations verified the formation of AlOx film by the mist-CVD. X-ray diffraction, X-ray photoelectron spectroscopy, ellipsometry and X-ray reflectivity analyses revealed that the synthesized amorphous AlOx films have bandgap of 6.5 eV, refractive index of 1.64 and mass density of 2.78 g/cm3. These values are comparable to those reported for high-quality amorphous Al2O3 thin films deposited by atomic layer deposition method. | |||||
書誌情報 |
en : Journal of the Ceramic Society of Japan 巻 127, 号 8, p. 590-593, 発行年 2019-08-01 |
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ISSN | ||||||
収録物識別子 | 18820743 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
関連識別子 | https://doi.org/10.2109/jcersj2.19017 | |||||
権利 | ||||||
権利情報 | (C) 2019 The Ceramic Society of Japan | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
日本十進分類法 | ||||||
主題 | 501 | |||||
論文ID(NAID) | ||||||
関連タイプ | isIdenticalTo | |||||
関連識別子 | 130007687006 | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | The Ceramic Society of Japan |